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Daimei Instrument Technology Service (Shanghai) Co., Ltd
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Daimei Instrument Technology Service (Shanghai) Co., Ltd

  • Courriel

    marketing@dymek.com

  • Téléphone

    13917837832

  • Adresse

    Room 306-308, Building 6, No. 35, Lane 2216, Jingao Road, Pudong, Shanghai

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Plasma enhanced chemical vapor deposition (PECVD) system

Modèle
Nature du fabricant
producteurs
Catégorie de produit
Lieu d'origine

Vue d'ensemble

Vision 410 Plasma Enhanced Chemical Vapor Deposition (PECVD) System - Continuation of PTI 790+Series, Continuing Successful Experience in Serving Diversified Markets

Détails du produit

1. Flexible sedimentation ability

·等离子体增强化学气相沉积(PECVD)系统Silicon based deposition process-Oxide, nitride, oxynitride, amorphous silicon(a-Si)、Silicon carbide(SiC

·等离子体增强化学气相沉积(PECVD)系统Research and Development

·等离子体增强化学气相沉积(PECVD)系统prototyping

·等离子体增强化学气相沉积(PECVD)系统Small batch production-PhotonicsSolid state lightingTheMEMSAnd nanotechnology

·等离子体增强化学气相沉积(PECVD)系统Application areas: interlayer insulation layer, passivation layer, encapsulation layer, mask layer, anti reflection layer


2. Performance value

等离子体增强化学气相沉积(PECVD)系统1. Large manual loading platform(406mm)

2. Excellent cleanliness

3. Highuniformity

4.High throughput 等离子体增强化学气相沉积(PECVD)系统

5. Reliable software

6.Compact footprint

7.Cost effective

8.easy to maintain

9.Adopting industry-leading components


3. Verified solutions

·Continued itPTI 790/790+The design concept

oManual loading, no load lock required (supports batch or single wafer)

oInstalled more than400Set system

oSimple technology and sturdy structure Competitive price and reliable quality


等离子体增强化学气相沉积(PECVD)系统



等离子体增强化学气相沉积(PECVD)系统




等离子体增强化学气相沉积(PECVD)系统



等离子体增强化学气相沉积(PECVD)系统



等离子体增强化学气相沉积(PECVD)系统



等离子体增强化学气相沉积(PECVD)系统




Compact footprint, saving space

等离子体增强化学气相沉积(PECVD)系统